離子泵的名詞解釋?zhuān)?/span>
以下為維基百科的英文解釋?zhuān)?/span>
離子泵（濺射離子泵）是一種類(lèi)型的真空泵，
An ion pump (also referred to as a sputter ion pump) is a type of vacuum pump which operates
by sputtering a metal getter.
Under ideal conditions, ion pumps are capable of reaching pressures as low as 10?11 mbar.
An ion pump first ionizes gas within the vessel it is attached to and employs a strong electrical
potential, typically 3–7 kV, which accelerates the ions to into the a solid electrode. Small bits
of the electrode are sputtered into the chamber.
Gasses are trapped by a combination of chemical reactions with the surface of the
highly-reactive sputtered material, and being physically trapped underneath that material.
離子泵的發(fā)明歷史：
The first evidence for pumping from electrical discharge was found 1858 by Julius Plücker,
who did early experiments on electrical discharge in vacuum tubes.
In 1937, Frans Michel Penning observed some evidence of pumping in the operation of his cold
cathode gauge.
These early effects were comparatively slow to pump, and were therefore not commercialized.
A major advance came in the 1950s, when Varian Associates were researching improvements
for the performance of vacuum tubes, particularly on improving the vacuum inside the klystron.
In 1957, Lewis D Hall, John C Helmer, and Robert L Jepsen filed a patent.
for a significantly improved pump, one of the earliest pumps that could get a vacuum
chamber to ultra-high vacuum pressures.